Area of research
Electrical and Electronic Engineering · Economics and Econometrics
Research interest
Research interests include Semiconductor materials and devices, Diverse Scientific and Economic Studies, Human auditory perception and evaluation, and Electron and X-Ray Spectroscopy Techniques.
Trap passivation of 4H-SiC/SiO2 interfaces by nitrogen annealing
Nitrogen Annealing As a Sustainable Method for Interface Trap Passivation in 4H-SiC Mosfets
P-Doped Porous Carbon as Metal Free Catalysts for Selective Aerobic Oxidation with an Unexpected Mechanism
Concentration, chemical bonding, and etching behavior of P and N at the SiO2/SiC(0001) interface
Atomic state and characterization of nitrogen at the SiC/SiO2 interface
Kinetics of nitrogen incorporation at the SiO2/4H-SiC interface during an NO passivation
Photochemical Water Oxidation by Crystalline Polymorphs of Manganese Oxides: Structural Requirements for Catalysis
High-Mobility Stable 4H-SiC MOSFETs Using a Thin PSG Interfacial Passivation Layer
Advancements in SiC Power Devices Using Novel Interface Passivation Processes
The Effects of Phosphorus at the SiO<sub>2</sub>/4H-SiC Interface
Eleventh African Materials Research Society (A-MRS) Conference
10th African Materials Research Society (A-MRS) Conference 2019
CONFERENCE: 9th African Materials Research Society (A-MRS) Conference 2017
8th African Materials Research Society Conference
7th Africa Materials Research Society (A-MRS) Conference
Interface Chemistry for Nanoscale Devices
Acquisition of a Solid State NMR Instrument at Rutgers University for Research and Teaching Activities in New Jersey Area
The Chemistry of Inorganic Nanoelectronic Interfaces
Support for Conference on Defects in Nanoelectronic Materials; St. Petersburg, Russia
Acquisition of a Variable Temperature Scanning Probe Microscope for Research and Education
An Investigation of Ultrathin SiO2 Films on Si: Gate Oxide Growth, Microstructure and Electronic Properties
The Dynamics of Metal Film Growth by Metal Organic Chemical Vapor Deposition
Modification of Metal and Semiconductor Surfaces by Ion Implantation: Potentials for Catalysis