Area of research
Condensed Matter Physics · Electronic, Optical and Magnetic Materials
Research interest
Research interests include GaN-based semiconductor devices and materials, Ga2O3 and related materials, Neuroscience and Neuropharmacology Research, and Spectroscopy and Laser Applications.
Kinetics of indium adlayer and droplet on InGaN surface and their roles in InGaN growth
Misfit accommodation in a single interface atomic layer at a highly lattice-mismatched InN/GaN
Growth of high-quality InGaN thin films over whole In content range and evaluation of thermoelectric properties
Effect of carbon coating on surface structure in annealing process of high-dose implanted/annealed SiC
Investigation of Nondestructive and Noncontact Electrical Characterization of GaN Thin Film on ScAlMgO<sub>4</sub> Substrate Using Terahertz Time‐Domain Spectroscopic Ellipsometry with Characteristic Impedance Analytical Model
GaN thickness dependence of GaN/AlN superlattices on face-to-face-annealed sputter-deposited AlN templates
Suppression of Mixing of Metastable Zincblende Phase in GaN Crystal Grown on ScAlMgO<sub>4</sub> Substrates by Radio‐Frequency Plasma‐Assisted Molecular Beam Epitaxy
Direct Growth of Nearly Lattice‐Matched InGaN on ScAlMgO<sub>4</sub> Substrates Using Radio‐Frequency Plasma‐Assisted Molecular Beam Epitaxy
Heavy electron doping in monolayer MoS<sub>2</sub> on a freestanding N-face GaN substrate
Influence of HCl concentration in source solution and growth temperature on formation of <i>α</i>-Ga<sub>2</sub>O<sub>3</sub> film via mist-CVD process
Direct growth of GaN film on ScAlMgO<sub>4</sub> substrate by radio-frequency plasma-excited molecular beam epitaxy
Control of Metal‐Rich Growth for GaN/AlN Superlattice Fabrication on Face‐to‐Face‐Annealed Sputter‐Deposited AlN Templates
Growth of Ga<sub>2</sub>O<sub>3</sub> film on ScAlMgO<sub>4</sub> substrate by mist-chemical vapor deposition
Substrate Terrace Width Dependence of Direct Growth of GaN on ScAlMgO<sub>4</sub> by Radio‐Frequency Molecular Beam Epitaxy
Study of contact resistance of <i>α</i>-Ga<sub>2</sub>O<sub>3</sub> on <i>m</i>-plane sapphire substrate with respect to Sn concentration using the circular transfer length method
Radio-frequency plasma-excited molecular beam epitaxy growth of GaN on graphene/Si(100) substrates