Area of research
Electrical and Electronic Engineering · Mechanics of Materials
Research interest
Research interests include Materials science, Trench, Capacitor, Dielectric, Leakage (economics), and Gate dielectric.
High-Breakdown and Low-Leakage 4H-SiC MOS Capacitor Based on HfO2/SiO2 Stacked Gate Dielectric in Trench Structures
Study of ZrO2 Gate Dielectric with Thin SiO2 Interfacial Layer in 4H-SiC Trench MOS Capacitors
Experiment and Analysis of Termination Robustness Design for 1200 V 4H-SiC MOSFET
Preparation of open porous polycaprolactone microspheres and their applications as effective cell carriers in hydrogel system