Area of research
Electrical and Electronic Engineering · Materials Chemistry
Research interest
Research interests include Materials science, Silicene, Condensed matter physics, Germanene, Spintronics, and Hexagonal crystal system.
Fundamentals of low-resistive 2D-semiconductor metal contacts: an ab-initio NEGF study
Hole-doping induced ferromagnetism in 2D materials
Advanced DFT–NEGF Transport Techniques for Novel 2-D Material and Device Exploration Including HfS<sub>2</sub>/WSe<sub>2</sub> van der Waals Heterojunction TFET and WTe<sub>2</sub>/WS<sub>2</sub> Metal/Semiconductor Contact
Hole-Doped 2D InSe for Spintronic Applications
Buckled two-dimensional Xene sheets
Intrinsic point defects in buckled and puckered arsenene: a first-principles study
Silicene on non-metallic substrates: Recent theoretical and experimental advances
Point defects in MoS 2 : Comparison between first-principles simulations and electron spin resonance experiments
Intrinsic electron traps in atomic-layer deposited HfO2 insulators
Topological to trivial insulating phase transition in stanene
Silicene: a review of recent experimental and theoretical investigations
Band alignment at interfaces of few-monolayer MoS2 with SiO2 and HfO2
Two-dimensional hexagonal tin: <i>ab initio</i> geometry, stability, electronic structure and functionalization
Engineering the electronic properties of silicene by tuning the composition of MoX <sub>2</sub> and GaX (X = S,Se,Te) chalchogenide templates
Two‐Dimensional Si Nanosheets with Local Hexagonal Structure on a MoS<sub>2</sub> Surface
An electric field tunable energy band gap at silicene/(0001) ZnS interfaces
A Thermally Stable and High-Performance 90-nm ${\rm Al}_{2}{\rm O}_{3}\backslash{\rm Cu}$-Based 1T1R CBRAM Cell
First-principles electronic functionalization of silicene and germanene by adatom chemisorption
Vibrational properties of epitaxial silicene layers on (111) Ag
Vibrational properties of silicene and germanene
First-principles study of strained 2D MoS2
Semiconducting-like filament formation in TiN/HfO2/TiN resistive switching random access memories