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Valeri Afanas’ev

KU Leuven · BE
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Area of research
Electrical and Electronic Engineering · Atomic and Molecular Physics, and Optics
Research interest
Research interests include Materials science, Amorphous solid, Electron, Capacitor, Trapping, and Optoelectronics.
h-index
citations
1,095
works
23
NIH funding
primary concept
email

Recent publications

Comprehensive Performance and Reliability Assessment of Se-based Selector-Only Memory
2024cited by 17position: middledoi
Evidence of Heat‐Assisted Atomic Migration in GeSe Self‐Selecting Memory at High Operating Current Density
physica status solidi (RRL) - Rapid Research Letters 2024cited by 14position: middledoi
Electron emission from deep traps in <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML"><mml:msub><mml:mi>HfO</mml:mi><mml:mn>2</mml:mn></mml:msub></mml:math> under thermal and optical excitation
Physical review. B./Physical review. B 2024cited by 10position: lastdoi
Capacitive Memory Window With Non-Destructive Read in Ferroelectric Capacitors
IEEE Electron Device Letters 2023cited by 48position: middledoi
Self-Rectifying Memory Cell Based on SiGeAsSe Ovonic Threshold Switch
IEEE Transactions on Electron Devices 2023cited by 37position: middledoi
Study of Contact Resistance Components in Short-Channel Indium-Gallium-Zinc-Oxide Transistor
IEEE Transactions on Electron Devices 2023cited by 35position: middledoi
Polarity‐Induced Threshold Voltage Shift in Ovonic Threshold Switching Chalcogenides and the Impact of Material Composition
physica status solidi (RRL) - Rapid Research Letters 2023cited by 22position: middledoi
Hole-doping induced ferromagnetism in 2D materials
npj Computational Materials 2022cited by 45position: middledoi
Polarity-dependent threshold voltage shift in ovonic threshold switches: Challenges and opportunities
2021 IEEE International Electron Devices Meeting (IEDM) 2021cited by 27position: middledoi
Ovonic Threshold‐Switching Ge<sub><i>x</i></sub>Se<sub><i>y</i></sub> Chalcogenide Materials: Stoichiometry, Trap Nature, and Material Relaxation from First Principles
physica status solidi (RRL) - Rapid Research Letters 2020cited by 78position: middledoi
The origin of negative charging in amorphous Al<sub>2</sub>O<sub>3</sub> films: the role of native defects
Nanotechnology 2019cited by 113position: lastdoi
Material-Selective Doping of 2D TMDC through Al<i><sub>x</sub></i>O<i><sub>y</sub></i> Encapsulation
ACS Applied Materials & Interfaces 2019cited by 64position: middledoi
A Sensitivity Map-Based Approach to Profile Defects in MIM Capacitors From &lt;inline-formula&gt; &lt;tex-math notation="LaTeX"&gt;${I}$ &lt;/tex-math&gt; &lt;/inline-formula&gt;–&lt;inline-formula&gt; &lt;tex-math notation="LaTeX"&gt;${V}$ &lt;/tex-math&gt; &lt;/inline-formula&gt;, &lt;inline-formula&gt; &lt;tex-math notation="LaTeX"&gt;${C}$ &lt;/tex-math&gt; &lt;/inline-formula&gt;–&lt;inline-formula&gt; &lt;tex-math notation="LaTeX"&gt;${V}$ &lt;/tex-math&gt; &lt;/inline-formula&gt;, and &lt
IEEE Transactions on Electron Devices 2019cited by 44position: middledoi
Intrinsic charge trapping in amorphous oxide films: status and challenges
Journal of Physics Condensed Matter 2018cited by 86position: middledoi
Two-Dimensional Crystal Grain Size Tuning in WS<sub>2</sub> Atomic Layer Deposition: An Insight in the Nucleation Mechanism
Chemistry of Materials 2018cited by 76position: middledoi
Intrinsic electron trapping in amorphous oxide
Nanotechnology 2018cited by 40position: middledoi
Interactions of hydrogen with amorphous hafnium oxide
Physical review. B./Physical review. B 2017cited by 43position: middledoi
Silicene on non-metallic substrates: Recent theoretical and experimental advances
Nano Research 2017cited by 41position: middledoi
Low leakage ZrO2 based capacitors for sub 20 nm dynamic random access memory technology nodes
Journal of Applied Physics 2016cited by 43position: middledoi
Controlled Sulfurization Process for the Synthesis of Large Area MoS<sub>2</sub> Films and MoS<sub>2</sub>/WS<sub>2</sub> Heterostructures
Advanced Materials Interfaces 2015cited by 70position: middledoi
Conduction barrier offset engineering for DRAM capacitor scaling
Solid-State Electronics 2015cited by 46position: middledoi
Electron Band Alignment at Interfaces of Semiconductors with Insulating Oxides: An Internal Photoemission Study
Advances in Condensed Matter Physics 2014cited by 46position: firstdoi
Identification of intrinsic electron trapping sites in bulk amorphous silica from ab initio calculations
Microelectronic Engineering 2013cited by 50position: lastdoi

Grants

No grants ingested yet.

Frequent collaborators

Sergiu Clima · KU Leuven7 papers (2020–2024)Jan Van Houdt · KU Leuven7 papers (2021–2024)Gouri Sankar Kar · KU Leuven7 papers (2020–2024) · 6 papers (2020–2024)Shreya Kundu · National University of Singapore6 papers (2020–2024)Alexander L. Shluger · KU Leuven6 papers (2013–2024) · 6 papers (2020–2024) · 6 papers (2020–2024)Hubert Hody · KU Leuven5 papers (2021–2024)Taras Ravsher · KU Leuven5 papers (2021–2024)A. Fantini · KU Leuven5 papers (2021–2024)R. Degraeve · KU Leuven5 papers (2021–2024)Attilio Belmonte · KU Leuven4 papers (2019–2024) · 4 papers (2021–2023)I. Shlyakhov · KU Leuven3 papers (2019–2020)A. Stesmans · KU Leuven3 papers (2015–2018) · 3 papers (2017–2018)Jack Strand · KU Leuven3 papers (2018–2024) · 3 papers (2015–2019)Thomas Mikolajick · North Carolina State University2 papers (2015–2016)
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