Area of research
Electrical and Electronic Engineering · Electronic, Optical and Magnetic Materials
Research interest
Research interests include Materials science, Annealing (glass), Atomic layer deposition, Dopant, Nanotechnology, and Nucleation.
Properties of ultrathin molybdenum films for interconnect applications
Efficient long-range conduction in cable bacteria through nickel protein wires
Material-Selective Doping of 2D TMDC through Al<i><sub>x</sub></i>O<i><sub>y</sub></i> Encapsulation
Atomic Layer Deposition of Ruthenium Thin Films from (Ethylbenzyl) (1-Ethyl-1,4-cyclohexadienyl) Ru: Process Characteristics, Surface Chemistry, and Film Properties
Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates
Nucleation and growth mechanisms of Al2O3 atomic layer deposition on synthetic polycrystalline MoS2
Dopant, composition and carrier profiling for 3D structures
Three-Dimensional Observation of the Conductive Filament in Nanoscaled Resistive Memory Devices
Metal‐Insulator Transition in ALD VO<sub>2</sub> Ultrathin Films and Nanoparticles: Morphological Control
Crystalline Properties and Strain Relaxation Mechanism of CVD Grown GeSn
Vacancy-modulated conductive oxide resistive RAM (VMCO-RRAM): An area-scalable switching current, self-compliant, highly nonlinear and wide on/off-window resistive switching cell