Area of research
Electrical and Electronic Engineering · Atomic and Molecular Physics, and Optics
Research interest
Research interests include Materials science, Atomic layer deposition, Nucleation, Annealing (glass), Deposition (geology), and Thin film.
Influence of support pore size and porosity on epoxide-based TFC membranes
Properties of ultrathin molybdenum films for interconnect applications
Electrical Investigation of Wake-Up in High Endurance Fatigue-Free La and Y Doped HZO Metal–Ferroelectric–Metal Capacitors
Cyclic Plasma Halogenation of Amorphous Carbon for Defect-Free Area-Selective Atomic Layer Deposition of Titanium Oxide
Integrated Cleanroom Process for the Vapor-Phase Deposition of Large-Area Zeolitic Imidazolate Framework Thin Films
Two-Dimensional Crystal Grain Size Tuning in WS<sub>2</sub> Atomic Layer Deposition: An Insight in the Nucleation Mechanism
Nanoscale etching of III-V semiconductors in acidic hydrogen peroxide solution: GaAs and InP, a striking contrast in surface chemistry
Plasma-Enhanced Atomic Layer Deposition of Two-Dimensional WS<sub>2</sub> from WF<sub>6</sub>, H<sub>2</sub> Plasma, and H<sub>2</sub>S
Atomic Layer Deposition of Ruthenium Thin Films from (Ethylbenzyl) (1-Ethyl-1,4-cyclohexadienyl) Ru: Process Characteristics, Surface Chemistry, and Film Properties
Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates
MoS<sub>2</sub> Functionalization with a Sub-nm Thin SiO<sub>2</sub> Layer for Atomic Layer Deposition of High-κ Dielectrics
High-throughput ion beam analysis at imec
Electrical Characterization of Ultrathin RF-Sputtered LiPON Layers for Nanoscale Batteries
Multilayer MoS<sub>2</sub> growth by metal and metal oxide sulfurization
Nucleation and growth mechanisms of Al2O3 atomic layer deposition on synthetic polycrystalline MoS2
Low temperature deposition of 2D WS<sub>2</sub> layers from WF<sub>6</sub> and H<sub>2</sub>S precursors: impact of reducing agents
Metal‐Insulator Transition in ALD VO<sub>2</sub> Ultrathin Films and Nanoparticles: Morphological Control
Crystalline Properties and Strain Relaxation Mechanism of CVD Grown GeSn
Atomic Layer Deposition of TiO<sub>2</sub> on Surface Modified Nanoporous Low-<i>k</i> Films
Process Study and Characterization of VO<sub>2</sub>Thin Films Synthesized by ALD Using TEMAV and O<sub>3</sub>Precursors