Area of research
Electrical and Electronic Engineering · Electronic, Optical and Magnetic Materials
Research interest
Research interests include Materials science, Atomic layer deposition, Deposition (geology), Nucleation, Nanoporous, and Composite material.
Two-Dimensional Crystal Grain Size Tuning in WS<sub>2</sub> Atomic Layer Deposition: An Insight in the Nucleation Mechanism
Plasma-Enhanced Atomic Layer Deposition of Two-Dimensional WS<sub>2</sub> from WF<sub>6</sub>, H<sub>2</sub> Plasma, and H<sub>2</sub>S
Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates
Low temperature deposition of 2D WS<sub>2</sub> layers from WF<sub>6</sub> and H<sub>2</sub>S precursors: impact of reducing agents
Impact of oxide liner properties on TSV Cu pumping and TSV stress
Effect of Pore Structure of Nanometer Scale Porous Films on the Measured Elastic Modulus
Atomic Layer Deposition of TiO<sub>2</sub> on Surface Modified Nanoporous Low-<i>k</i> Films