Area of research
Materials Chemistry · Electrical and Electronic Engineering
Research interest
Research focused on Atomic layer deposition and Deposition (geology), with related work in Vinyl alcohol, Monolayer, Chemical vapor deposition. Notable publications include 'Low temperature deposition of 2D WS 2 layers from WF 6 and H 2 S precursors: impact of reducing agents', 'Plasma-Enhanced Atomic Layer Deposition of Two-Dimensional WS 2 from WF 6 , H 2 Plasma, and H 2 S', and 'Controlled Sulfurization Process for the Synthesis of Large Area MoS 2 Films and MoS 2 /WS 2 Heterostructures'.
Reactive plasma cleaning and restoration of transition metal dichalcogenide monolayers
Plasma-Enhanced Atomic Layer Deposition of Two-Dimensional WS<sub>2</sub> from WF<sub>6</sub>, H<sub>2</sub> Plasma, and H<sub>2</sub>S
Multilayer MoS<sub>2</sub> growth by metal and metal oxide sulfurization
Highly efficient and stable MoS<sub>2</sub>FETs with reversible n-doping using a dehydrated poly(vinyl-alcohol) coating
Low temperature deposition of 2D WS<sub>2</sub> layers from WF<sub>6</sub> and H<sub>2</sub>S precursors: impact of reducing agents
Controlled Sulfurization Process for the Synthesis of Large Area MoS<sub>2</sub> Films and MoS<sub>2</sub>/WS<sub>2</sub> Heterostructures